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Park XE7

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    Park XE7

Park XE7

Park XE7 has all the state-of-the-art technology you’ve come to expect from Park Systems, at a price your lab can afford. Designed with the same attention to detail as our more advanced models, the XE7 allows you to do your research on time and within budget.

Product Description

Uncompromised High Performance

Park XE7 provides accurate measurement at highest nanoscale resolution than any other products in its class.It allows you to obtain sample images and its characteristic measurements true to its nano structure thanks to its flat, orthogonal, and linear scan measurements by its unique AFM architecture: independent XY and Z, flexure based scans. Furthermore, Park’s unique True Non-Contact™ mode provides you with the sharpest images, scan after scan without declining resolution.

For Current and Future Needs

Park XE7 empowers you to innovate now and in the future. It gives you ready access to the largest number of measurement modes in the industry. You can employ any of these modes now, and in the future to support your evolving needs. What’s more, the XE7 has the most open access design in the market that allows you to integrate and combine accessories and instruments to tailor it to your unique research requirements.

Easy to Use and High Productivity

Park XE7 together with its intuitive graphical user interface, and its automated tools, allows even novice users get from sample placement to scan results, fast. Starting from pre-aligned tip mount, easy sample and tip exchange, simple laser alignment, on-axis top-down optical viewing, to user friendly scan controls and software processing, the XE7 provides highest research productivity in AFM.

Economical Beyond the System Cost

Not only is Park XE7 the most affordable as a research grade AFM, it is also the most economical in total cost of ownership. Park’s True Non-Contact™ mode technology found in the XE7 allows users to save money on costly probe tips. Moreover, Park XE7 offers you much longer product life and upgradeability as a result of its compatibility with the most extensive types of modes and options available in the industry.

Accurate XY Scan by Crosstalk Elimination

Park Systems’ advanced Crosstalk Elimination (XE) scan system effectively addresses all of the above-mentioned problems. In this configuration, we used a 2-dimentional flexure stage to scan the sample in only the XY direction, and a stacked piezoelectric actuator to scan the probe cantilever in the Z direction only. The flexure stage used for the XY scanner is made of solid aluminum. It demonstrates high orthogonality and an excellent out-of-plane motion profile. The flexure stage can scan large samples (~1 kg) up to a few 100 Hz in the XY direction. This scan speed is sufficient because the bandwidth requirement for the XY axes is much lower than that for the Z axis. The stacked piezoelectric actuator for the Z-scanner has a high resonance frequency (~10 kHz) with a high pushpull force when appropriately pre-loaded.

XE scan system

XE-systems

  • independent, loop XY and Z flexure scanners for sample and probe tip

XY flexure scanner

3img 4

  • Flat and orthogonal XY scan with low residual bow

XE-Peformence

3img 7Figure 9. Zero background curvature by Park Systems XE-system (a) and typical background curvature of a conventional AFM system with a tube scanner (b). (c) shows the cross section of these background curvatures.

Figure 9. shows unprocessed AFM images of a bare silicon wafer taken with the XE-system (a), and with a conventional AFM (b). Since the silicon wafer is atomically flat, most of the curvatures in the image are scanner-induced artifacts. Figure 9. (c) shows the cross section of the images in Figure 9. (a) and (b). Since the tube scanner has intrinsic background curvatures, the maximum out-of-plane motion is as much as 80 nm when the X-axis moves 15 μm. The XE scan system has less than 1nm of out-of-plane motion for the same scan range. Another advantage of the XE scan system is its Z-servo response.

3img 83img 9
Figure 10. Figure 11.

Figure 10. is an image of a porous polymer sphere (Styrene Divinyl Benzene), whose diameter is about 5 µm, taken with the XE-system in Non-Contact mode. Since the Z-servo response of the XE-system is very accurate, the probe can precisely follow the steep curvature of the polymer sphere as well as small porous surface structures without crashing or sticking to the surface. Figure 11. shows another example that demonstrates the high performance of the z-servo response with a flat background.

Best Life, by True Non-Contact™ Mode

In True Non-Contact™ Mode, the tip-sample distance is successfully maintained at a few nanometers in the net attractive regime of inter-atomic force. The small amplitude of tip oscillation minimizes the tip-sample interaction, resulting in superb tip preservation and negligible sample modification.

True Non-Contact™ Mode

non-contact

  • Less tip wear = Prolonged high-resolution scan
  • Non-destructive tip-sample interaction = Minimized sample modification
  • Immunity from parameter dependent results

Tapping Imaging

tapping-imaging

  • Quick tip wear = Blurred low-resolution scan
  • Destructive tip-sample interaction = Sample damage and modification
  • Highly parameter-dependent

Longer Tip Life and Less Sample Damage

The sharp end of an AFM tip is so brittle that once it touches a sample, it becomes instantly blunt and limits the resolution of an AFM and reduces the quality of the image. For softer samples, the tip will damage the sample and also result in inaccuracies of sample height measurements. Consequently, preserving tip integrity enables consistent high resolution and accurate data. True Non-Contact Mode of theXE-AFM superbly preserves the tip, resulting in much longer tip life and less sample damageThe figure, displayed in 1:1 aspect ratio, shows the unprocessed raw data image of a shallow trench isolation sample imaged by the XE-AFM, whose depth is also confirmed by scanning electron microscope (SEM). The same tip used in the imaging of the sample shows no tip wear even after taking 20 images. xe-afm

Park XE7 Specifications

XY Scanner

Single-module flexure XY scanner with closed-loop control
Scan range : 100μm x 100μm
50μm x 50μm
10μm x 10μm

Manual Stage

XY travel range : 13 × 13 mm
Z travel range : 29.5 mm
Focus travel range : 70 mm

Z Scanner range

Guided high-force Z scanner
Scan range : 12 µm
15 µm

Sample Mount

Sample size : Up to 100 mm
Thickness : Up to 20 mm

Vision

Direct on-axis vision of sample surface and cantilever
Coupled with 10× objective lens (20× optional)
Field-of-view : 480 × 360 µm
CCD : 1 Mpixel

Software

XEP

Dedicated system control and data acquisition software
Adjusting feedback parameters in real time
Script-level control through external programs(optional)

XEI

AFM data analysis software

Electronics

High performance DSP : 600 MHz with 4800 MIPS
Maximum 16 data images
Maximum data size : 4096 × 4096 pixels
Signal inputs : 20 channels of 16 bit ADC at 500 kHz samplings
Signal outputs : 21 channels of 16 bit DAC at 500 kHz settling
Synchronous signal : End-of-image, end-of-line, and end-of-pixel TTL signals
Active Q control (optional)
Cantilever spring constant calibration (optional)
CE Compliant
Power : 120 W
Signal Access Module (Optional)

AFM Modes
(*Optionally available)

Standard Imaging

True Non-Contact AFM
Basic Contact AFM
Lateral Force Microscopy (LFM)
Phase Imaging
Intermittent (tapping) AFM

Force Measurement*

Force Distance (FD) Spectroscopy
Force Volume Imaging

Dielectric/Piezoelectric Properties*

Electric Force Microscopy (EFM)
Dynamic Contact EFM (EFM-DC)
Piezoelectric Force Microscopy (PFM)
PFM with High Voltage

Mechanical Properties*

Force Modulation Microscopy (FMM)
Nanoindentation
Nanolithography
Nanolithography with High Voltage
Nanomanipulation
Piezoelectric Force Microscopy (PFM)

Magnetic Properties*

Magnetic Force Microscopy (MFM)
Tunable MFM

Optical Properties*

Tip-Enhanced Raman Spectroscopy (TERS)
Time-Resolved Photo Current Mapping (PCM)

Electrical Properties*

Conductive AFM
IV Spectroscopy
Scanning Kelvin Probe Microscopy (SKPM/KPM)
SKPM with High Voltage
Scanning Capacitance Microscopy (SCM)
Scanning Spreading-Resistance Microscopy (SSRM)
Scanning Tunneling Microscopy (STM)
Time-Resolved Photo Current Mapping (PCM)

Chemical Properties*

Chemical Force Microscopy with Functionalized Tip
Electrochemical Microscopy (EC-STM and EC-AFM)

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